SOLARIS 150mm UV RTP

Main Features:

• Wafer handling: Manual loading of wafer into the oven, single wafer processing

• Wafer sizes: 2″, 3″, 4″, 5″, 6″

• Ramp up rate: 1-150°C per second, user-controllable.

• Recommended steady state duration: Unlimited, dependent on Temp & cooling

• Ramp down rate: Temperature Dependent, max 150°C per second.

• Recommended steady state temperature range: RT – 1200°C

• Temperature accuracy: +1.78°C total errors

• Thermocouple temperature accuracy: +1.1°C

• Temperature repeatability: +2°C or better at Steady State

• Temperature uniformity: +2.5°C or better across a 6″ (150 mm) wafer at 1150°C.

• For a titanium silicidation process, no more than 4% increase in non-uniformity

         during the first anneal at 650°C to 700°C.