- Bonder & Flip Chip
- Atmospheric Plasma Cleaner
- Vacuum Plasma Cleaner
- Spin Rinse Dryer
- Dispensing & Micro/Nano Printing System
- Lithography Process Systems
- Diffusion and LPCVD Furnaces
- Rapid Thermal Processing & Annealing
- Vacuum Soldering Systems
- Parylene Coating System
- Deposition System
- Hollow Cathode Plasma Source
- Plasma Etching System
- Sintering Presses
- Wet Process & Plating Tool
- Vacuum Chamber
- Electron Beam & Photo Resist
- Deposition Materials
Q 240S
The Q stands for quartz glass chambers.
Plasma equipment of series Q are mostly used in semi-conductor technology and in the area of analysis and medical technology.
Application examples: Cleaning and incineration of organic samples and varnishes in micro mechanics as well as for silicium wafers in semi-conductor industry.
Description
A system with the diameter of our Q240S but with reduced chamber depth for the sake of saving space
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Dimensions:
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L: 620mm W: 550mm H: 500mm
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Weight:
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75 KG
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Volume:
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9 Liter
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Process chamber:
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Quarzglas, 240mm Ø , B: 244mm
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Microwave output:
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2,45 GHz / 50 – 1200 Watt
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Inclusive:
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1 gas channel (gas distribution system inside the process chamber), up to 3 channels available
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Substrate holder (optional):
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aluminium, custom design possible
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Vacuum connection:
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DN 40 ISO-KF
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Venting:
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electromagnetic solenoid valve
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Pump system:
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up to 25m³/h
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Chamber door:
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you can choose between hinged-type with viewing port and drawer door with attached support rods
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Wafer size:
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up to 150mm, at a number of 25 wafers
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