PMMA & Copolymer_Electron Beam Resist

Positive Tone Electron Beam Resists_PMMA & Copolymer Resists

PMMA Resist is the positive tone resist for electron beam lithography. We offer PMMA in a wide range of molecular weights and thicknesses. We also offer P(MMA-MAA) copolymer resists that can be used in bilayer resist processes.

PMMA Resist is the industry standard positive tone electron beam resist used across academia and industry for high resolution features and lift-off applications. It can also be used in nanoimprint applications as well as other fab and R&D processes such as graphene flake transfer. P(MMA-MAA) copolymer resists can be used in conjunction with PMMA for bilayer resist applications such as T-gates. It can also be used on its own as a high sensitivity positive tone resist.

If you are looking for a high resolution resist with good etch resistance, take a look at our SML Resist.

Below is a table of our available PMMA products. If you have any specific requirements, please contact us for more information.

We also offer P(MMA(8.5)MAA) copolymer resist in a range of dilutions in ethyl lactate, up to EL13 (13% solid content).

Below are our suggested processing conditions for PMMA:

• Casing solvent: Anisole
• Pre-bake: 180°C for 2 minutes
• Exposure: 100-300 μC/cm2 @ 30kV
• Developer: MIBK:IPA (1:3) for 30s. All other PMMA developers will also work with SML resist.
• Stopper: IPA for 15s
• Remover: Acetone

The shelf life of the resist is 12 months. Store at room temperature away from direct sunlight.

Find more information here.