AL 18 (19 inch rack)
AL stands for aluminum chamber. It is mainly used in the semiconductor, solar, plastics and electronics industries.
For activating plastic and metal surfaces or for creating high-purity surfaces.
Application examples:Â Pretreatment of metal and plastic parts prior to bonding, gluing, painting or printing, ultra-fine cleaning of glasses, metals, ceramics or other vacuum-compatible substrates.
Category: Vacuum Plasma Cleaner
Tags: photoresist removal, plasma cleaner, surface activation, surface cleaning
Description
A 19 inch rack with two frequencies for polymerization
Dimensions:
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              L: 530mm W: 600mm H: 1800mm
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Weight:
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                   95 KG
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Volume:
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                  18 Liter
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Process chamber:
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          aluminium, L: 250mm W: 290mm H:250mm
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Microwave output:
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         2,45 GHz / 50 – 1200 Watt
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Inclusive:
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                  1 gas channel (gas distribution system inside the process chamber), up to 3 channels available
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Substrate holder (optional):
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 aluminium, custom design possible
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Vacuum connection:
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        DN 25 ISO-KF
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Venting:
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                   electromagnetic solenoid valve
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Pump system:
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              15-35 m³/h
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Chamber door:
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             hinged-type with viewing port
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