Compact Thermal Reactors (CTR)

Features & Benefits of CTR Compact Diffusion Furnaces

Expertech’s compact diffusion furnaces can process up to 200 mm round, 156 mm square substrates, or irregularly shaped parts with the same process capability as full-size platforms. CTR systems provide world-class process performance, featuring full recipe control and storage via a host PC supervisor, with high-technology data logging and graphic capabilities. Available with manual or fully automated loading systems, CTR systems offer several benefits:

Exceptionally Reliable & Fully Automated Technology
High-Performance Heating Elements
Atmospheric & LPCVD Configurations
Full Suite of Safety Interlocks
Integrated Control System with GUI for Interfacing with Multiple Tools
Smallest Footprint in Equipment Class with a Compact Design
Stackable Design Accommodating 4 CTR-125, 4 CTR-150, 3 CTR-200, and variable in CTR-300
Features Process Controller Options
Controlled Rate of Wafer Load and Unload with Optional Recipe Controlled Loading Mechanism
Low-Cost of Ownership

This system has capability far beyond the tabletop or laboratory diffusion furnaces of the past. Fully automated and recipe driven the results rival the uniformity and film quality of full size production systems.

Model CTR-125 Specifications

CTR-125 is designed to process up to 125 mm diameter substrates in a tube up to 170 mm. Able to accept smaller diameter process tubes for optimal processing of smaller substrates, this model can be configured with up to four gas loops, featuring dimensions of 32” W by 17.6” H by 61.8” D.

Model CTR-150 Specifications

Designed to process substrates with a maximum diameter of 150 mm, the CTR-150 features a tube of up to 235 mm in diameter. It can be configured with up to six gas loops with dimensions of 34.7” W by 21.1” H by 80” D and can accept smaller diameter process tubes for optimal processing of smaller substrates.

Model CTR-200 Specifications

The CTR-200 system can process substrates with a diameter of up to 200 mm in round configurations and 156 mm in square configurations. It is designed with a tube featuring a maximum diameter of 300 mm and can accept smaller diameter process tubes for optimal processing of smaller substrates. CTR-200 models can be configured with up to six gas loops with dimensions of 35” W by 24” H by 80” D.

Model CTR-300 Specifications

CTR-300 is engineered to process substrates with a diameter of up to 300 mm. This high-technology compact diffusion furnace is still in development and is expected for availability in late 2024.

Additional Design Options for CTR Systems

With additional design options, compact diffusion furnaces can be engineered to your needs. Customizations available to CTR systems include:

Can be configured with manual or automatic loading
Choose a Chronos-II or Mypro-II process controller
Selection of advanced supervisor systems
Design with high-temperature processing

CTR Compact Diffusion Furnace Applications

CTR systems offer high-quality production performance in small-footprint furnace technology. These compact diffusion furnaces are designed for a variety of applications, with exceptional capabilities for atmospheric processes, LPCVD, and solar cell production operations.

Atmospheric Processes

Annealing
Thermal Oxidation
Diffusion
Drive/Anneal

LPCVD Processes

PolySilicon/Amorphous Silicon
In-Situ Doped (ISD)
PolySiGE
Silicon Nitride
Low-Temperature Oxide
High-Temperature Oxide
Liquid Source Oxides
Vacuum Anneals

Solar Cell Processing

Doping
Drive-In
Anneals
Silicon Nitride

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