Horizontal Thermal Reactors (HTR) & Furnaces
Horizontal Thermal Reactors (HTR) & Reduced Footprint Horizontal Furnaces
HTR and HTR-RF horizontal furnaces are the workhorses of thermal processing, providing high-volume capabilities for semiconductor, solar, and other large-batch processes. Offering a large load size capability, Expertech’s new and remanufactured horizontal diffusion furnaces are compatible with cleanrooms down to Class 1 for world-class, low-contamination production solutions for 50mm to 450mm wafer sizes. With the ability to stack 3 or 4 horizontal furnaces, you can achieve exceptional, high production throughputs.
Features & Benefits of Horizontal Diffusion Furnaces from Expertech
Expertech’s horizontal furnaces deliver high production throughput and reliability through premium features. Featuring a proven design and easy maintainability, the HTR and HTR-RF class of diffusion furnaces provide the solutions you need for high-quality thermal processing applications.
HTR horizontal diffusion furnaces offer volume production workhorse capabilities to meet your needs. We also provide the HTR-RF design for production-quality processing in a reduced space for pilot lines and product development areas. Choosing horizontal furnace equipment from Expertech delivers first-rate benefits, such as:
- Space-Saving Designs with 2-4 Tube Levels in One Footprint
- Low In-Film Particles through Use of HEPA-Filtered Clean Air Load Stations
- High-Quality Films through the Use of Orbitally Welded Gas Systems with Cleanroom Gas System Assembly
- Flexibility of Control and Supervisory Systems
- Safety Interlocks Protecting Personnel and Equipment
- Long Equipment Production Life through Component Selection and Design
- Completes a Wide Range of Atmospheric and LPCVD Processes
HTR & HTR-RF Series Horizontal Furnace Specifications
The HTR and HTR-RF Series diffusion furnaces have specifications to meet the requirements of various high-volume production processes. For wafer sizes between 50 mm and 450 mm, the HTR series features heated zones up to 48 inches long to accommodate the larger load size, while the HTR-RF supports smaller load sizes and wafer sizes between 50 mm and 300 mm. Additional specifications include:
HTR Furnace Performance
- Up to 48-inch Flat Zone Load Size
- Up to 59 Steps per Recipe
- Typical Diffusion/Oxidation: 200+ Product and Test, Plus Filler Wafers per Tube (Exact Load Size Process Dependent)
- Typical LPCVD: 150 Product and Test, Plus Filler Wafers per Tube (Exact Load Size Process Dependent)
HTR System Operation
- Low-Temperature Element: 250-600°C
- Standard Temperature Element: 500-1150°C
- High-Temperature Element: Above 1150°C
- Uniformity: Flat Zone, 16-48 inches (40.64-121.9 cm)
- Temp Control: ±0.5°C for Processes Above 600°C
- Class 1 Laminar Flow, Mirror-Finish 300 Series Stainless Steel Surfaces
- ULPA Filter Tested to 99.9995% of Particles Greater Than 0.12 µm
Processes Available
Atmospheric:
- Wet/Dry Oxidation
- Anneals
- Forming Gas Anneals
- 100% High-Flow Hydrogen Anneals
- Phosphorus Predeposition, POCl3
LPCVD:
- Silicon Nitride Stoichiometric & Low Stress
- TEOS Uniform Grain Polysilicon (Amorphous and Uniform Grain, N and P Doped)
- HTO
- Deposited Oxides (LTO, BPSG & PSG
Discover the CTR Series for High-Powered Capabilities with a Tiny Footprint
In addition to high-volume horizontal furnaces, Expertech provides compact furnaces in our CTR Series. Designed with powerful automated technology, CTR diffusion furnaces can process up to 200 mm round, 156 mm square substrates, or irregularly shaped parts with film quality and process uniformity that rivals full-size diffusion equipment.
Our compact thermal reactors provide world-class processing performance with full recipe control and storage via a host PC supervisor in manual or fully automated solutions ideal for:
- Pilot Lines
- Low-Volume Production Facilities
- R&D Operations
- Government Sites
- Academic Institutions
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