- Bonder & Flip Chip
- Atmospheric Plasma Cleaner
- Vacuum Plasma Cleaner
- Spin Rinse Dryer
- Dispensing & Micro/Nano Printing System
- Lithography Process Systems
- Diffusion and LPCVD Furnaces
- Rapid Thermal Processing & Annealing
- Vacuum Soldering Systems
- Parylene Coating System
- Deposition System
- Hollow Cathode Plasma Source
- Plasma Etching System
- Sintering Presses
- Wet Process & Plating Tool
- Vacuum Chamber
- Electron Beam & Photo Resist
- Deposition Materials
Q150 (Tabletop Unit)
The Q stands for quartz glass chambers.
Plasma equipment of series Q are mostly used in semi-conductor technology and in the area of analysis and medical technology.
Application examples:Â Cleaning and incineration of organic samples and varnishes in micro mechanics as well as for silicium wafers in semi-conductor industry.
Description
Easy to operate and simple to load. Our Q-series provides fast and reliable plasma processing
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Dimensions:
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             L: 500mm W: 550mm H: 370mm
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Weight:
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                  40 KG
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Volume:
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                  4 Liter
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Process chamber:
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          Quarzglas, 150mm Ø, B: 244mm
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Microwave output:
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         2,45 GHz / 50 – 1200 Watt
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Inclusive:
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                  1 gas channel (gas distribution system inside the process chamber), up to 3 channels available
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Substrate holder (optional):
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 aluminium, custom design possible
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Vacuum connection:
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        DN 25 ISO-KF
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Venting:
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                   electromagnetic solenoid valve
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Pump system:
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              up to 25m³/h
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Chamber door:
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             you can choose between hinged-type with viewing port and drawer door with attached support rods
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Wafer size:
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                 up to 125mm, at a number of 25 wafers
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