- Bonder & Flip Chip
- Atmospheric Plasma Cleaner
- Vacuum Plasma Cleaner
- Spin Rinse Dryer
- Dispensing & Micro/Nano Printing System
- Lithography Process Systems
- Diffusion and LPCVD Furnaces
- Rapid Thermal Processing & Annealing
- Vacuum Soldering Systems
- Parylene Coating System
- Deposition System
- Hollow Cathode Plasma Source
- Plasma Etching System
- Sintering Presses
- Wet Process & Plating Tool
- Vacuum Chamber
- Electron Beam & Photo Resist
- Deposition Materials
Wet Bench System µCHEM
- Designed for the use in clean room environment, the shell is made of polypropylene or stainless steel for solvent applications
- Suitable for etching application in the field of micro technology and semiconductors
- Heatable Quartz Tank for clean wafer processing
- Additional process cells could be integrated, made of PTFE, PVDF, PP,…
- Circulation and Heating systems
- fire extinguishing on request
- fully automatic processfully automatic chemical drain and dosing on request
- compatible to different wafer size up to 12″, fully automatic handling of the Carriers
Additional components
- Spin coater, Hot plates, Megasonic cleaning systems…
- Rinsing cell or Quick Dump Rinser
- Automation for handling wafer baskets possible
- Customized solutions are possible
MOT Semicon can help you to design specific workflow concepts offering you flexible high grade wet bench solutions.
Category: Wet Process & Plating Tool
Tag: Wet Bench