- Bonder & Flip Chip
- Atmospheric Plasma Cleaner
- Vacuum Plasma Cleaner
- Spin Rinse Dryer
- Dispensing & Micro/Nano Printing System
- Lithography Process Systems
- Rapid Thermal Processing & Annealing
- Vacuum Soldering Systems
- Parylene Coating System
- Deposition System
- Hollow Cathode Plasma Source
- Plasma Etching System
- Sintering Presses
- Vacuum Chamber
- Materials
amc 2500
All-rounder for multiple processes & substrates
Compact service package for high throughput:
- Wafer diameter: 2“ bis 8“
- According to configuration of wafer handling up to 4 I/O-stations (max. 4 x open carriers or 3 x SMIF)
- Max. 7 individually selectable process modules
- 2 two-link wafer handlers or
- 1 two-link wafer handler on linear track
- Outer dimension: W x L: 1414 mm x 2048 mm
Category: Lithography Process Systems
Tags: Developer, Hot plate, Lift off, Lithography, Photo resist, Spin coater, Spray coater
Reviews (0)
Be the first to review “amc 2500” Cancel reply
Reviews
There are no reviews yet.