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amc 2000 Fully automatic single-wafer processing - Image 1
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amc 2000 Fully automatic single-wafer processing
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Home Lithography Process Systems amc 2000 Fully automatic single-wafer processing
amc 1000 Fully automatic single-wafer processing
amc 1000 Fully automatic single-wafer processing
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amc 2500 Fully automatic single-wafer processing
amc 2500 Fully automatic single-wafer processing

amc 2000 Fully automatic single-wafer processing

workhorse, designed for flexible use or very high throughput

Highly flexible machine configuration and processing of different wafer sizes:

  • Wafer diameters: 2“ to 8“
  • Up to 4 I/O stations for substrates 2“ to 8“ (max. 4x open carriers or 2x SMIF) or
  • Max. 5 individually selectable process modules
  • 1 two-link wafer handler
  • Outer dimension W x L: 1382 mm x 1596 mm

Download brochures here. 

Category: Lithography Process Systems Tags: Developer, Etching, Lift off, Lithography, Photo resist, Spin coater, Spray coater

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      • Bonder & Flip Chip
        • Die Bonder
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      • Atmospheric Plasma Cleaner
      • Vacuum Plasma Cleaner
      • Spin Rinse Dryer
      • Dispensing & Micro/Nano Printing System
        • Ultra Precise Dispensing System
        • Micro-Nano Dispenser
        • Dispenser Types
      • Spectrophotometer
      • Lithography Process Systems
      • Diffusion and LPCVD Furnaces
      • Rapid Thermal Processing & Annealing
      • Vacuum Soldering Systems
      • Parylene Coating System
      • Deposition System
      • Hollow Cathode Plasma Source
      • Etching System
      • Sintering Presses
      • Wet Process & Plating Tool
      • Vacuum Chamber
      • Electron Beam & Photo Resist
      • Deposition Materials
    • Applications
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