amc 2500 Fully automatic single-wafer processing
All-rounder for multiple processes & substrates
Compact service package for high throughput:
- Wafer diameter: 2“ bis 8“
- According to configuration of wafer handling up to 4 I/O-stations (max. 4 x open carriers or 3 x SMIF)
- Max. 7 individually selectable process modules
- 2 two-link wafer handlers or
- 1 two-link wafer handler on linear track
- Outer dimension: W x L: 1414 mm x 2048 mm
Download brochures here.
Category: Lithography Process Systems
Tags: Developer, Hot plate, Lift off, Lithography, Photo resist, Spin coater, Spray coater
