- Bonder & Flip Chip
- Atmospheric Plasma Cleaner
- Vacuum Plasma Cleaner
- Spin Rinse Dryer
- Dispensing & Micro/Nano Printing System
- Lithography Process Systems
- Diffusion and LPCVD Furnaces
- Rapid Thermal Processing & Annealing
- Vacuum Soldering Systems
- Parylene Coating System
- Deposition System
- Hollow Cathode Plasma Source
- Plasma Etching System
- Sintering Presses
- Wet Process & Plating Tool
- Vacuum Chamber
- Electron Beam & Photo Resist
- Deposition Materials
Ancillary Solvents
We provide a range of developers and removers for PMMA and SML resists as well as high purity solvents.
– PMMA Developer
– HSQ Developer
– Copolymer Developer
– SML Developer
Below is a table of our available developers. If you have any specific requirements, please contact us for more information.
| Product | Resolution | Sensitivity/Throughput |
|---|---|---|
| PMMA-DEV1 | Medium | High |
| PMMA-Dev2 | High | Medium |
| PMMA-Dev3 | Very High | Low |
| MIBK (Pure) | Low | High |
| IPA:Water (7:3) | Very High | Very High |
Removers:
PMMA & SML resists that have been soft-baked can be removed using standard laboratory solvents that we can provide (acetone). For hard baked resist, a stronger solution of KOH yields excellent results.
