- Bonder & Flip Chip
- Atmospheric Plasma Cleaner
- Vacuum Plasma Cleaner
- Spin Rinse Dryer
- Dispensing & Micro/Nano Printing System
- Lithography Process Systems
- Rapid Thermal Processing & Annealing
- Vacuum Soldering Systems
- Parylene Coating System
- Deposition System
- Hollow Cathode Plasma Source
- Plasma Etching System
- Sintering Presses
- Vacuum Chamber
- Materials
amc 1000
Transitional model to fully automatic low-scale production
Flexible machine configuration and processing of different wafer sizes:
- Wafer diameters: 2“ to 8“
- Up to 4 I/O stations for 2“ to 6“ (max. 4x open carriers or 2x SMIF) or
- Up to 2 I/O stations for 8“ (open carriers or SMIF)
- Max. 3 individually selectable process modules
- 1 two-link wafer handler
- Outer dimension W x L: 1236 mm x 1150 mm
Category: Lithography Process Systems
Tags: Developer, Hot plate, Lift off, Lithography, Photo resist, Spin coater, Spray coater
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