Quantum X litho
Quantum X litho_Maskless Lithography System
Quantum X litho enables precise, versatile and aligned grayscale lithography for high-throughput 2.5D microfabrication – powering rapid prototyping, patterning, master template fabrication and wafer-scale production.
Two-Photon Polymerization
Two-Photon Polymerization (2PP) is the highest precision additive manufacturing technology and enables high-resolution 3D printing of virtually any micro-, meso-, and macroscale structures with submicron features and unparalleled shape accuracy.
Maskless lithography for precise and fast 2.5D microfabrication
Quantum X litho is a versatile maskless lithography system offering superior design freedom and streamlined workflows – from fast job setup to high-performance printing and post-processing. It enables high-throughput 2.5D microfabrication for applications such as rapid prototyping, advanced patterning, master template fabrication, and wafer-scale production.
Powered by Two-Photon Grayscale Lithography 2GL®, the system delivers high-precision freeform microoptics, microlens arrays, Fresnel lenses, and hybrid optical components that combine diffractive and refractive features.
Maskless lithography for advanced designs
Quantum X litho also supports patterning of complex microfluidic architectures and bioinspired topographies, including organic nano- and microstructured surfaces. The proprietary 2GL® technology combines high throughput with exceptional shape accuracy, enabling advanced 2.5D designs with tall features up to 1,000 µm, thus exceeding conventional height limitations.
Top-tier industrial performance
2GL® accelerates innovation through rapid design iteration — enabling sub-day cycles from concept to printed part. Structures printed with Quantum X litho seamlessly integrate into industrial replication workflows such as nanoimprint lithography, hot embossing, and micro injection molding. Combined with nanoPrintX, the confocal detection module ensures precise alignment for wafer-level production. The optional 3D printing by 2GL® mode expands the system’s capabilities toward advanced 3D printing.
2GL® grayscale lithography enabling rapid prototyping, patterning and mastering
Quantum X litho in facts and figures
FEATURES:
Included features
- Stunningly rapid and accurate 2.5D printing enabled by Two-Photon Grayscale Lithography (2GL®)
- Wafer-scale production on transparent and opaque wafers
Optional features
- High-resolution 3D printing based on Two-Photon Polymerization (2PP) for intricate nano-, micro- and mesostructures
- Up to 60 times faster speeds at superior quality compared to classic 2PP, achieved through 3D printing by 2GL® (Two-Photon Grayscale Lithography)
- Aligned 3D printing on various substrates enabled by Aligned 2-Photon Lithography (A2PL®)
- Automatic alignment to fiducials on wafers enabled by confocal detection module
- Automatic printing aligned to fiber cores enabled by the Fiber Printing Set
- Automatic dispenser for efficient batch processing and wafer-level production
BENCHMARK SCORES:
| Surface roughness (Ra) | down to ≤ 5 nm |
| Feature size control | down to 100 nm in x/y direction |
| Shape accuracy (Sa) | down to ≤ 200 nm |
| Stitching-free part diameter | up to 1,750 µm |
| Maximum scan speed | 6.25 m/s divided by lens magnification |
Given peak values, only achieved under specific conditions such as printing parameters, print heads, photoresins and designs.
GENERAL SYSTEM PROPERTIES:
| Substrates | Wafers from 1” to 8” (25.4 mm to 200 mm) Glass, silicon, and further transparent and opaque materials |
| Photoresins | Nanoscribe polymer photoresins Open to third-party or custom materials |
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