Primaxx® Monarch 3

HF Vapor Etch System for R&D and Small Batch Processing

The Primaxx® Monarch 3 vapor hydrogen fluoride (VHF) etch system is designed to perform selective etch release via a controlled anhydrous HF/alcohol etch process. The Monarch 3 is a compact module includes a 3-wafer process chamber including a semi-automatic 3-wafer loader with load lock, and is designed for research laboratories and small volume production environments. An integrated panel PC, with on-board electronics minimizes cleanroom footprint and the system has been designed for easy wafer size changes and maintenance.

Description

Applications

  • MEMS release etch
  • MicroLED release
  • Vapor release of RF devices

Markets

  • MEMS
  • RF Device Manufacturing
  • Photonics
  • Advanced Packaging

Benefits

  • Compatible with 100mm-200mm wafers
  • Batch size up to 3 wafers
  • Standalone system
  • Small footprint includes process chamber, gas/liquid panel and pressure/vacuum components

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