Primaxx® Monarch 3
HF Vapor Etch System for R&D and Small Batch Processing
The Primaxx® Monarch 3 vapor hydrogen fluoride (VHF) etch system is designed to perform selective etch release via a controlled anhydrous HF/alcohol etch process. The Monarch 3 is a compact module includes a 3-wafer process chamber including a semi-automatic 3-wafer loader with load lock, and is designed for research laboratories and small volume production environments. An integrated panel PC, with on-board electronics minimizes cleanroom footprint and the system has been designed for easy wafer size changes and maintenance.
Category: Etching System
Tags: Advanced Packaging, HF Vapor Etch, KLA, MEMS, MicroLED, photonics, Primaxx, RF device, SPTS, VHF etch
Description
Applications
- MEMS release etch
- MicroLED release
- Vapor release of RF devices
Markets
- MEMS
- RF Device Manufacturing
- Photonics
- Advanced Packaging
Benefits
- Compatible with 100mm-200mm wafers
- Batch size up to 3 wafers
- Standalone system
- Small footprint includes process chamber, gas/liquid panel and pressure/vacuum components
Find brochures here.
