Primaxx® uEtch
HF Vapor Etch Systems for Single-Wafer Processing in R&D Applications
The Primaxx® uEtch compact single-wafer HF vapor etch system is specifically designed for university and small research laboratories. The fully integrated system includes a built-in HF gas cabinet, which can process single whole wafers (100-200mm) or die on a carrier. PLC (Programmable Logic Controller) control gives multi-user features and extensive safety interlocks. HF vapor processes developed on the uEtch are transferable to Primaxx Monarch 3, Monarch 25 and Monarch 300 production systems, offering a path from concept to production.
Description
Applications
- MEMS release etch
- MicroLED release
- Vapor release of RF devices
Markets
- MEMS
- RF Device Manufacturing
- Photonics
Benefits
- Fully integrated, compact system includes built-in HF gas cabinet
- PLC controlled with multi-user features and extensive safety interlocks
- Can process single whole wafers (100-200mm) or die on a carrier
HF vapor processes are transferable to SPTS 3- and 25-wafer production systems, offering a path from concept to production
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