Primaxx® Monarch 300
HF Vapor Etch System for 200/300mm Wafers in Volume Production
The Primaxx® Monarch 300 vapor hydrogen fluoride (VHF) etch system is fully integrated and designed to perform selective MEMS etch release via a controlled anhydrous HF/alcohol etch process. This system is compatible with 200mm and 300mm wafers, offering high throughput, high uptime batch processing for up to 13 wafers per batch. Extensive process control and monitoring functions ensure the yield, reliability and repeatability required in volume production.
The Monarch 300 is compatible with the Primaxx® 300 fxP wafer handling platform and supports up to 6 VHF etch process modules. This VHF etch module can also be combined with other SPTS etch or deposition modules on a SPTS Versalis™ platform, if required.
Description
Applications
- MEMS release etch
- MicroLED release
- Vapor release of RF devices
Markets
- MEMS
- RF Device Manufacturing
- Photonics
- Advanced Packaging
Benefits
- Compatible with 200 and 300mm wafers
- Batch size up to 13 wafers
- Available on Primaxx 300mm fxP platform (or Versalis fxP)
- Small footprint includes process chamber, gas/liquid panel and pressure/vacuum components
Find brochures here.
